Atomic diffusion‐induced deep levels near ZnSe/GaAs(100) interfaces
作者:
A. D. Raisanen,
L. J. Brillson,
L. Vanzetti,
A. Bonanni,
A. Franciosi,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 66,
issue 24
页码: 3301-3303
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.113737
出版商: AIP
数据来源: AIP
摘要:
Luminescence spectroscopy measurements of ZnSe/GaAs(100) heterojunctions grown by molecular beam epitaxy reveal the formation of deep levels near ‘‘buried’’ interfaces upon thermal annealing. A pronounced emission at 1.9–2.0 eV appears at temperatures in the 300–400 °C range depending on the ZnSe growth conditions with a constant activation energy of 1.10 eV. X‐ray photoemission spectroscopy indicates a correlation between this deep level and atomic diffusion of Ga and Zn across the heterointerface. Zn‐rich ZnSe growth conditions dramatically reduce this emission, highlighting the importance of local interface composition on thermal stability. ©1995 American Institute of Physics.
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