首页   按字顺浏览 期刊浏览 卷期浏览 Sputtered SiNxfilm for self‐aligned Si‐Zn diffusion into GaAs and AlGaAs
Sputtered SiNxfilm for self‐aligned Si‐Zn diffusion into GaAs and AlGaAs

 

作者: W. X. Zou,   R. Boudreau,   H. T. Han,   T. Bowen,   Song Stone Shi,   D. S. L. Mui,   J. L. Merz,  

 

期刊: Journal of Applied Physics  （AIP Available online 1995）
卷期: Volume 77, issue 12  

页码: 6244-6246

 

ISSN:0021-8979

 

年代: 1995

 

DOI:10.1063/1.359155

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A new technology for self‐aligned Si‐Zn diffusion into GaAs and AlGaAs is described. In this technology, closed‐tube Si diffusion is obtained from a sputtered SiNxfilm, and Zn diffusion self‐aligned to the Si diffusion window is obtained by reusing the SiNxfilm as the mask. The key to a successful self‐aligned Si‐Zn diffusion is that the SiNxfilm is controlled to have a proper refractive index profile. ©1995 American Institute of Physics.

 

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