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Microvoids in amorphous Si1−xCx:H alloys studied by small‐angle x‐ray scattering

 

作者: D. L. Williamson,   A. H. Mahan,   B. P. Nelson,   R. S. Crandall,  

 

期刊: Applied Physics Letters  (AIP Available online 1989)
卷期: Volume 55, issue 8  

页码: 783-785

 

ISSN:0003-6951

 

年代: 1989

 

DOI:10.1063/1.101779

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The microstructure of hydrogenated amorphous silicon‐carbon alloys has been analyzed by small‐angle x‐ray scattering, infrared absorption, and density measurements. Decreasing density with C incorporation is due to microvoids about 0.6 nm in average radius, which are either approximately spherical in shape or randomly oriented nonspheres. The microvoid number density increases from about 5×1019/cm3fora‐Si:H to about 4×1020/cm3fora‐Si0.7C0.3:H. The CH3species probably causes the enhanced microvoid formation in these alloys. A large fraction of the microvoid surfaces is not hydrogenated.

 

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