Microvoids in amorphous Si1−xCx:H alloys studied by small‐angle x‐ray scattering
作者:
D. L. Williamson,
A. H. Mahan,
B. P. Nelson,
R. S. Crandall,
期刊:
Applied Physics Letters
(AIP Available online 1989)
卷期:
Volume 55,
issue 8
页码: 783-785
ISSN:0003-6951
年代: 1989
DOI:10.1063/1.101779
出版商: AIP
数据来源: AIP
摘要:
The microstructure of hydrogenated amorphous silicon‐carbon alloys has been analyzed by small‐angle x‐ray scattering, infrared absorption, and density measurements. Decreasing density with C incorporation is due to microvoids about 0.6 nm in average radius, which are either approximately spherical in shape or randomly oriented nonspheres. The microvoid number density increases from about 5×1019/cm3fora‐Si:H to about 4×1020/cm3fora‐Si0.7C0.3:H. The CH3species probably causes the enhanced microvoid formation in these alloys. A large fraction of the microvoid surfaces is not hydrogenated.
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