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Molecular‐beam epitaxial growth and characterization of pseudomorphic InAs/In0.52Al0.48As quantum wells

 

作者: J. L. de Miguel,   M.‐H. Meynadier,   M. C. Tamargo,   R. E. Nahory,   D. M. Hwang,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  (AIP Available online 1988)
卷期: Volume 6, issue 2  

页码: 617-619

 

ISSN:0734-211X

 

年代: 1988

 

DOI:10.1116/1.584414

 

出版商: American Vacuum Society

 

关键词: MOLECULAR BEAM EPITAXY;QUANTUM WELL STRUCTURES;INDIUM ARSENIDES;ALUMINIUM ARSENIDES;PHOTOLUMINESCENCE;OPTICAL PROPERTIES;INTERFACE STRUCTURE;ROUGHNESS;InAs;(Al,In)As

 

数据来源: AIP

 

摘要:

The evolution of the structural and optical quality of molecular‐beam epitaxial (MBE) grown InAs/In0.52Al0.48As pseudomorphic quantum wells with increasing well thickness has been analyzed by transmission electron microscopy (TEM) and photoluminescence measurements. TEM was used to assess the commensurability of the samples as well as to confirm the build up of stress as the InAs layer is made thicker. Under our growth conditions, intense intrinsic photoluminescence is observed for InAs layers as thick as 30 Å. Beyond this thickness a deterioration of the photoluminescence characteristics occurs due to roughening of the interfaces rather than to relaxation of the InAs lattice.

 

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