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Thermoelectric properties of splat‐cooled amorphous In20Te80, Ga20Te80, and Ge15...
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Thermoelectric properties of splat‐cooled amorphous In20Te80, Ga20Te80, and Ge15Te85
作者:
S. K. Hsiung,
Rong Wang,
期刊:
Journal of Applied Physics
(AIP Available online 1978)
卷期:
Volume 49,
issue 1
页码: 280-284
ISSN:0021-8979
年代: 1978
DOI:10.1063/1.324380
出版商: AIP
数据来源: AIP
摘要:
The electrical transport properties of splat‐cooled amorphous semiconductors In20Te80, Ga20Te80, and Ge15Te85were investigated by measuring the thermoelectric powerSand dc resistivity &rgr; between 140 and 300 °K. For as‐quenched samples, bothSand log&rgr; show linear relationships with 1/T, indicating ap‐type intrinsiclike conduction ≳90&percent; due to holes. To account for this intrinsiclike conduction, we propose a high degree of structural integrity in the splat‐cooled amorphous samples, i.e., a structure having the homogeneity of the liquid and consisting of continuous Te chains with In, Ga, and Ge attached to broken bonds. However, annealed samples show extrinsiclike conduction from 0 to −130 °C, and bothSand log&rgr; show decrease linearly with respect to the decrease of temperatureT. The effect of heat treatment interpreted as a structural disordering, appears due to atomic segregation at local areas.
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