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Thermoelectric properties of splat‐cooled amorphous In20Te80, Ga20Te80, and Ge15Te85

 

作者: S. K. Hsiung,   Rong Wang,  

 

期刊: Journal of Applied Physics  (AIP Available online 1978)
卷期: Volume 49, issue 1  

页码: 280-284

 

ISSN:0021-8979

 

年代: 1978

 

DOI:10.1063/1.324380

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The electrical transport properties of splat‐cooled amorphous semiconductors In20Te80, Ga20Te80, and Ge15Te85were investigated by measuring the thermoelectric powerSand dc resistivity &rgr; between 140 and 300 °K. For as‐quenched samples, bothSand log&rgr; show linear relationships with 1/T, indicating ap‐type intrinsiclike conduction ≳90&percent; due to holes. To account for this intrinsiclike conduction, we propose a high degree of structural integrity in the splat‐cooled amorphous samples, i.e., a structure having the homogeneity of the liquid and consisting of continuous Te chains with In, Ga, and Ge attached to broken bonds. However, annealed samples show extrinsiclike conduction from 0 to −130 °C, and bothSand log&rgr; show decrease linearly with respect to the decrease of temperatureT. The effect of heat treatment interpreted as a structural disordering, appears due to atomic segregation at local areas.

 

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