首页   按字顺浏览 期刊浏览 卷期浏览 In situRHEED and XPS studies on ceramic layer epitaxy in UHV system
In situRHEED and XPS studies on ceramic layer epitaxy in UHV system

 

作者: Kideomi Koinuma,   Mamoru Yoshimoto,   Hirotoshi Nagata,   Takuya Hashimoto,   Tadashi Tsukahara,   Satoshi Gonda,   Shunji Watanabe,   Maki Kawai,   Takashi Hanada,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1991)
卷期: Volume 219, issue 1  

页码: 326-335

 

ISSN:0094-243X

 

年代: 1991

 

DOI:10.1063/1.40278

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Ceramic films relating to high‐Tc superconductors were grown in a UHV deposition‐analysis system. Against our intuition that large oxygen deficiency is inevitable in the growth of oxide films in UHV, required oxidation state was achieved either by using such a highly oxidative gas as NO2or by choosing thermodynamically stable oxides. Two‐dimensional growth of ceramics were verified in MBE growth of Bi‐Sr‐Cu‐O as well as in laser MBE growth of various ceramic thin films. The growth mode and the oxidation state of the films were investigated byin situRHEED and XPS analyses. Discussion is extended to the possibility of our method for constructing new ceramics layers which may exhibit higher Tc.

 

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