首页   按字顺浏览 期刊浏览 卷期浏览 Avalanche Breakdown in Epitaxial SiCp‐nJunctions
Avalanche Breakdown in Epitaxial SiCp‐nJunctions

 

作者: C. van Opdorp,   J. Vrakking,  

 

期刊: Journal of Applied Physics  (AIP Available online 1969)
卷期: Volume 40, issue 5  

页码: 2320-2322

 

ISSN:0021-8979

 

年代: 1969

 

DOI:10.1063/1.1657980

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The reverse current‐voltage characteristics of epitaxial SiCp‐njunctions were investigated. After electrolytic etching the junctions showed sharp breakdown. The largest value found for the maximum field at breakdown is 5×106V/cm. Microplasma pulses were observed analogous to but three orders‐of‐magnitude smaller than those hitherto reported for other materials.

 

点击下载:  PDF (228KB)



返 回