首页   按字顺浏览 期刊浏览 卷期浏览 Nanostructure of hot-wire-deposited a-SiGe:H alloys by small-angle x-ray scattering
Nanostructure of hot-wire-deposited a-SiGe:H alloys by small-angle x-ray scattering

 

作者: D. L. Williamson,   Y. Xu,   B. P. Nelson,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1999)
卷期: Volume 462, issue 1  

页码: 272-278

 

ISSN:0094-243X

 

年代: 1999

 

DOI:10.1063/1.57974

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A series ofa-Si1−xGex:Halloys with0⩽x⩽1has been prepared by the hot-wire chemical-vapor deposition method and characterized by the small-angle x-ray scattering technique. All samples are inhomogeneous on a nanometer scale with a significant increase in the amount of heterogeneity abovex=0.1and this correlates with degraded opto-electronic properties. Oriented features detected in the nanostructure are associated with a directed flux of deposition species from the heated filament. ©1999 American Institute of Physics.

 

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