Nanostructure of hot-wire-deposited a-SiGe:H alloys by small-angle x-ray scattering
作者:
D. L. Williamson,
Y. Xu,
B. P. Nelson,
期刊:
AIP Conference Proceedings
(AIP Available online 1999)
卷期:
Volume 462,
issue 1
页码: 272-278
ISSN:0094-243X
年代: 1999
DOI:10.1063/1.57974
出版商: AIP
数据来源: AIP
摘要:
A series ofa-Si1−xGex:Halloys with0⩽x⩽1has been prepared by the hot-wire chemical-vapor deposition method and characterized by the small-angle x-ray scattering technique. All samples are inhomogeneous on a nanometer scale with a significant increase in the amount of heterogeneity abovex=0.1and this correlates with degraded opto-electronic properties. Oriented features detected in the nanostructure are associated with a directed flux of deposition species from the heated filament. ©1999 American Institute of Physics.
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