We have studied the lattice recovery by rapid thermal annealing ofSi+-implanted InP using Raman spectroscopy. The crystallinity recovery for different annealing temperatures of samples totally amorphized by the implantation can be monitored by means of their Raman spectra. However, free-charge coupling with the LO mode and possible misorientation of the recrystallized material may alter substantially the first-order Raman spectrum, making it unreliable for a good characterization of the lattice recovery. The study of second-order Raman spectrum overcomes the problems present in the analysis of first-order Raman spectrum and provides suitable criteria to assess the recrystallization of the implanted and annealed samples. After rapid thermal annealing at 875 °C for 10 s, the intensity of the second-order peaks approaches 70&percent; of its value in virgin InP, and third-order Raman peaks are also clearly detected, evidencing the good lattice recovery achieved. ©1997 American Institute of Physics.