Charge‐state‐dependent iron precipitation in silicon
作者:
A. Mesli,
T. Heiser,
N. Amroun,
P. Siffert,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 57,
issue 18
页码: 1898-1900
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.104005
出版商: AIP
数据来源: AIP
摘要:
The kinetics of interstitial iron precipitation inp‐type silicon are investigated. During annealing, the iron charge state is controlled by the applied reverse voltage and its effect on the precipitation is studied. We observe that iron in the neutral charge state (Fe0i) precipitates preferentially in three‐dimensional nucleation centers while Fe+ivanishes in the dislocation lines (rod‐like nucleation centers). These centers are created during the fast cooling procedure necessary to dissolve iron in the silicon matrix.
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