Influence of conditions of r.f. sputtering on chemical constitution and structure of PZT-type thin films
作者:
Z. Surowiak,
D. Czekaj,
A.A. Bakirov,
V.P. Dudkevich,
期刊:
Integrated Ferroelectrics
(Taylor Available online 1999)
卷期:
Volume 23,
issue 1-4
页码: 229-257
ISSN:1058-4587
年代: 1999
DOI:10.1080/10584589908210152
出版商: Taylor & Francis Group
关键词: Ferroelectrics;thin film;r.f. sputtering;PZT;chemical constitution;structure;microstructure;intermediate layer
数据来源: Taylor
摘要:
By means of r.f. sputtering the polycrystalline Pb(Zr0.53Ti0.45W0.01Cd0.01)O3ferroelectric thin films ofdf= (0.5 − 10) μm in thickness have been obtained. A disk ceramics obtained by hot pressing method or a layer of powdered ceramic samples was used as a target. On the basis of structure analysis by X-ray diffraction conditions which are necessary for obtaining thin ferroelectric, stoichiometric films having a perovskite-type structure have been determined. Regions of amorphous film deposition, pyrochlore-type structure or mixture of pyrochlore-type and perovskite-type structure are also presented in diagram “working gas pressureversussubstrate temperature” (p02-Ts). New experimental data on pyrochlore-type structure metastability and its conversion into perovskite-type structure caused by thermal treatment are obtained.
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