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Influence of conditions of r.f. sputtering on chemical constitution and structure of PZT-type thin films

 

作者: Z. Surowiak,   D. Czekaj,   A.A. Bakirov,   V.P. Dudkevich,  

 

期刊: Integrated Ferroelectrics  (Taylor Available online 1999)
卷期: Volume 23, issue 1-4  

页码: 229-257

 

ISSN:1058-4587

 

年代: 1999

 

DOI:10.1080/10584589908210152

 

出版商: Taylor & Francis Group

 

关键词: Ferroelectrics;thin film;r.f. sputtering;PZT;chemical constitution;structure;microstructure;intermediate layer

 

数据来源: Taylor

 

摘要:

By means of r.f. sputtering the polycrystalline Pb(Zr0.53Ti0.45W0.01Cd0.01)O3ferroelectric thin films ofdf= (0.5 − 10) μm in thickness have been obtained. A disk ceramics obtained by hot pressing method or a layer of powdered ceramic samples was used as a target. On the basis of structure analysis by X-ray diffraction conditions which are necessary for obtaining thin ferroelectric, stoichiometric films having a perovskite-type structure have been determined. Regions of amorphous film deposition, pyrochlore-type structure or mixture of pyrochlore-type and perovskite-type structure are also presented in diagram “working gas pressureversussubstrate temperature” (p02-Ts). New experimental data on pyrochlore-type structure metastability and its conversion into perovskite-type structure caused by thermal treatment are obtained.

 

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