Far-infrared spectroscopic, magnetotransport, and x-ray study of athermal annealing in neutron-transmutation-doped silicon
作者:
D. W. Donnelly,
B. C. Covington,
J. Grun,
C. A. Hoffman,
J. R. Meyer,
C. K. Manka,
O. Glembocki,
S. B. Qadri,
E. F. Skelton,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 5
页码: 680-682
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.119828
出版商: AIP
数据来源: AIP
摘要:
We present evidence that the energy introduced by a short laser pulse focused to high intensity on a small spot on the surface of neutron-transmutation-doped silicon electrically activates impurities far away from the focal spot. The activation of the impurities is measured by far-infrared spectroscopy of shallow donor levels and by magnetotransport characterization. Electrical activity is comparable to that obtained with conventional thermal annealing. X-ray rocking curve measurements show strain in the area of the focal spot, but none at large distances from the focal spot. ©1997 American Institute of Physics.
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