Oxygen-related defects in low phosphorous contentGaAs1−yPygrown by metal organic vapor phase epitaxy
作者:
J. G. Cederberg,
K. L. Bray,
T. F. Kuech,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 82,
issue 5
页码: 2263-2269
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.366032
出版商: AIP
数据来源: AIP
摘要:
The mixed Group V ternary alloyGaAs1−yPy(y<0.17)has been grown by metal organic vapor phase epitaxy and doped with oxygen using the oxygen precursor, diethylaluminum ethoxide[C2H5OAl(C2H5)2].Controlled oxygen doping was accomplished over the range of0<y<0.17.Deep level transient spectroscopy measurements reveal the presence of several oxygen-related deep levels. These levels, previously found in GaAs:O, vary with alloy composition over the investigated range. An additional deep level, most probably associated with the presence of misfit-related defects, has been identified. Photoluminescence performed on the oxygen-doped samples indicates that band edge emission is reduced and lower energy emission features are introduced over the wavelength range of 1000–1200 nm as a result of oxygen incorporation. ©1997 American Institute of Physics.
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