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Oxygen-related defects in low phosphorous contentGaAs1−yPygrown by metal organic vapor phase epitaxy

 

作者: J. G. Cederberg,   K. L. Bray,   T. F. Kuech,  

 

期刊: Journal of Applied Physics  (AIP Available online 1997)
卷期: Volume 82, issue 5  

页码: 2263-2269

 

ISSN:0021-8979

 

年代: 1997

 

DOI:10.1063/1.366032

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The mixed Group V ternary alloyGaAs1−yPy(y<0.17)has been grown by metal organic vapor phase epitaxy and doped with oxygen using the oxygen precursor, diethylaluminum ethoxide[C2H5OAl(C2H5)2].Controlled oxygen doping was accomplished over the range of0<y<0.17.Deep level transient spectroscopy measurements reveal the presence of several oxygen-related deep levels. These levels, previously found in GaAs:O, vary with alloy composition over the investigated range. An additional deep level, most probably associated with the presence of misfit-related defects, has been identified. Photoluminescence performed on the oxygen-doped samples indicates that band edge emission is reduced and lower energy emission features are introduced over the wavelength range of 1000–1200 nm as a result of oxygen incorporation. ©1997 American Institute of Physics.

 

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