Thermal‐resistive current filamentation in the cathode plasma of a pinch‐reflex diode
作者:
V. K. Tripathi,
P. F. Ottinger,
J. Guillory,
期刊:
Journal of Applied Physics
(AIP Available online 1983)
卷期:
Volume 54,
issue 6
页码: 3043-3048
ISSN:0021-8979
年代: 1983
DOI:10.1063/1.332508
出版商: AIP
数据来源: AIP
摘要:
Electron current flow drawn off a hollow cylindrical cathode in a pinch‐reflex ion diode is observed to have a filamentary structure. Such filamentation can lead to nonuniform anode turn on and ion emission. Consequently, ion beam brightness is degraded. In this context a purely growing thermal‐resistive instability in the cathode plasma is examined. The instability causes current filamentation and grows on a time scale comparable to the electron–ion energy equilibration time. Electron inelastic collisions have a stabilizing influence on the instability.
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