首页   按字顺浏览 期刊浏览 卷期浏览 An apparatus for microsectioning diffusion samples by sputtering
An apparatus for microsectioning diffusion samples by sputtering

 

作者: J. N. Mundy,   S. J. Rothman,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  （AIP Available online 1983）
卷期: Volume 1, issue 1  

页码: 74-76

 

ISSN:0734-2101

 

年代: 1983

 

DOI:10.1116/1.572313

 

出版商: American Vacuum Society

 

关键词: sputtering;diffusion;milling;ion sources;nickel oxides;chromium;cutting

 

数据来源: AIP

 

摘要:

A new sputtering apparatus for taking thin sections from solid‐state diffusion samples is described. New features include the use of a Kaufman‐type ion gun, high‐yield chamber geometry, and a catcher‐foil advance mechanism capable of taking 32 sections without breaking vacuum. The apparatus can also be used as a general laboratory facility for ion milling.

 

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