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UV‐sustained CO laser discharge II. Discharge studies

 

作者: D. R. Suhre,   S. A. Wutzke,  

 

期刊: Journal of Applied Physics  (AIP Available online 1981)
卷期: Volume 52, issue 6  

页码: 3858-3860

 

ISSN:0021-8979

 

年代: 1981

 

DOI:10.1063/1.329851

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A high‐pressure (2×4×77) cm3UV‐sustained discharge was operated in a (1:3:9, CO:N2:He) gas mixture doped with either NO or C2H4. The electrical energy loading into the gas was parameterized with respect to the UV source energy, additive density, reduced temperature, and sustainer voltage. All the results were consistent with a discharge operated below the glow voltage and sustained entirely by photoionization. A maximum energy loading of about 400 J/liter was achieved.

 

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