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Submicron structuring of YBa2Cu3O7thin films with electron beam lithography

 

作者: W. Albrecht,   W. Langheinrich,   H. Kurz,   U. Poppe,   H. Soltner,   J. Schubert,  

 

期刊: Journal of Applied Physics  （AIP Available online 1990）
卷期: Volume 68, issue 7  

页码: 3778-3779

 

ISSN:0021-8979

 

年代: 1990

 

DOI:10.1063/1.346303

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Thin films of high‐temperature superconducting YBaCuO deposited by dc‐sputtering on SrTiO3substrates are structured by electron beam lithography on a submicron scale. Details of the technology processes involved are presented. The sudden transition of structures below 1 &mgr;m into the semiconducting state is discussed.

 

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