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Effusive flow delay times for gaseous species in a compact rf ion source (abstract)

 

作者: R. F. Welton,   A. Piotrowski,   G. D. Alton,   S. N. Murray,  

 

期刊: Review of Scientific Instruments  (AIP Available online 1996)
卷期: Volume 67, issue 3  

页码: 1353-1353

 

ISSN:0034-6748

 

年代: 1996

 

DOI:10.1063/1.1147245

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A rf ion source is presently being developed and evaluated as a potential candidate for use in generating radioactive ion beams (RIBs) for the experimental research program at the Holifield Radioactive Ion Beam Facility (HRIBF) now under construction at the Oak Ridge National Laboratory. For this application, any time delays that are excessively long with respect to the half‐life of the radioactive species of interest can result in significant losses of the RIB intensity; therefore the times for effusive flow through the ion source are of fundamental importance since they set limits on the minimum half‐life of radioactive species that can be processed in the source. Complementary experimental and computational techniques have been developed which can be used to determine the characteristic delay times for gaseous species in low‐pressure ion source assemblies. These techniques are used to characterize the effusive delay times for the stable counterparts of various atomic and molecular radioactive species in the ORNL‐rf source: He, Ne, Ar, Kr, Xe, H2, CO, CO2, N2, N2O, and O2. ©1996 American Institute of Physics.

 

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