首页   按字顺浏览 期刊浏览 卷期浏览 Study of the electron resonance and the development line in both ECRISs and RFISs (abst...
Study of the electron resonance and the development line in both ECRISs and RFISs (abstract)

 

作者: S. G. Zakhary,  

 

期刊: Review of Scientific Instruments  (AIP Available online 1996)
卷期: Volume 67, issue 3  

页码: 1321-1321

 

ISSN:0034-6748

 

年代: 1996

 

DOI:10.1063/1.1146706

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The motion of a charged particle in a crossed rf field and dc magnetic field describes the occurrence of resonance (increase of the energy gained by the particle between collisions) which causes low breakdown voltage, higher plasma intensity, and higher extracted ion current. The resonance in the microwave discharge is essential for plasma electron heating. The development line in both ECRIS’s and RFIS’s includes an increase of the electron population in the discharge to intensify the plasma and increase the extracted ion current; plasma cooling with the use of electron injection or gas mixing increases the lifetime of the ions in the plasma allowing for multiple ionization collision and increase of the highly charged ion species. Adaptation of both electrical and geometrical properties of these sources can lead to obtaining lower beam emittance. ©1996 American Institute of Physics.

 

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