Molecular beam epitaxy of GaAs and AlGaAs on Si
作者:
B‐Y. Tsaur,
G. M. Metze,
期刊:
Applied Physics Letters
(AIP Available online 1984)
卷期:
Volume 45,
issue 5
页码: 535-536
ISSN:0003-6951
年代: 1984
DOI:10.1063/1.95305
出版商: AIP
数据来源: AIP
摘要:
Epitaxial layers of GaAs and AlxGa1−xAs (0.2≤x≤0.5) have been grown directly on single‐crystal Si (100) substrates, without an intermediate Ge layer, by molecular beam epitaxy (MBE). To improve nucleation, after being chemically cleaned the Si substrates were preheated in the MBE system to reduce surface contamination and achieve ordered surface reconstruction prior to growth. Reflection electron diffraction, Rutherford backscattering channeling, and photoluminescence measurement were used to characterize the epitaxial layers. The AlGaAs layers were found to be superior to the GaAs layers.
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