Tantalum deposition on and reaction with the hydrogen terminated diamond (100) surface studied by Auger electron and electron energy loss spectroscopy
作者:
M. Pitter,
M. B. Hugenschmidt,
R. J. Behm,
期刊:
Applied Physics Letters
(AIP Available online 1996)
卷期:
Volume 68,
issue 18
页码: 2508-2510
ISSN:0003-6951
年代: 1996
DOI:10.1063/1.115837
出版商: AIP
数据来源: AIP
摘要:
The evolution of the tantalum/diamond interface upon room‐temperature Ta deposition on the (100) surface of a boron doped, synthetically grown diamond single crystal was monitored by Auger electron spectroscopy (AES), ionization loss spectroscopy (ILS), and electron energy loss spectroscopy (ELS). Characteristic loss peaks indicate carbide formation at the interface from very low coverages on, reflecting the strong interaction between tantalum and carbon. Thicker layers of TaC are formed during subsequent thermal annealing by diffusion of carbon into the tantalum film, at the same time the topmost diamond region is transformed into poorly ordered graphitic carbon. ©1996 American Institute of Physics.
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