In situthickness monitoring and control for highly reproducible growth of distributed Bragg reflectors
作者:
Y. M. Houng,
M. R. T. Tan,
B. W. Liang,
S. Y. Wang,
D. E. Mars,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1994)
卷期:
Volume 12,
issue 2
页码: 1221-1224
ISSN:1071-1023
年代: 1994
DOI:10.1116/1.587049
出版商: American Vacuum Society
关键词: SEMICONDUCTOR LASERS;BRAGG REFLECTION;HETEROSTRUCTURES;TERNARY COMPOUNDS;ALUMINIUM ARSENIDES;GALLIUM ARSENIDES;FILM GROWTH;THICKNESS;TEMPERATURE EFFECTS;INTERFEROMETRY;AlAs;GaAs;(Al,Ga)As
数据来源: AIP
摘要:
A theoretical model was developed to simulate the apparent substrate temperature oscillation during the growth of AlAs/AlxGa1−xAs,x=0 and 0.25, distributed Bragg reflectors (DBR) for 980‐ and 780‐nm vertical cavity surface emitting lasers, respectively. The simulated data were then used forinsitumonitoring and feedback control of layer thickness by a simple pyrometric interferometry technique to obtain a highly reproducible DBR. These measurements can be performed with continuous substrate rotation and without any growth interruption. The reproducibility of the center wavelength and full width at half‐maximum of the reflectivity stop band with a variation of<±0.2% and<±0.4% for the AlAs/GaAs and AlAs/AlGaAs mirror stacks, respectively, were achieved.
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