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Effect of oxygen on the diffusion of Ni in Pt in Pt‐Ni‐Pt films

 

作者: Chin‐An Chang,   W. K. Chu,  

 

期刊: Journal of Applied Physics  (AIP Available online 1981)
卷期: Volume 52, issue 1  

页码: 512-514

 

ISSN:0021-8979

 

年代: 1981

 

DOI:10.1063/1.328428

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have studied the effect of oxygen on the diffusion of Ni into Pt in the Pt‐Ni‐Pt films. Below 400 °C, the diffusion rates of Ni into both Pt layers are greatly reduced by oxygen. Above 500 °C, however, Ni rapidly mixes with Pt layers, which leads to the formation of Ni oxide on the Pt surface in the presence of oxygen.

 

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