Effect of oxygen on the diffusion of Ni in Pt in Pt‐Ni‐Pt films
作者:
Chin‐An Chang,
W. K. Chu,
期刊:
Journal of Applied Physics
(AIP Available online 1981)
卷期:
Volume 52,
issue 1
页码: 512-514
ISSN:0021-8979
年代: 1981
DOI:10.1063/1.328428
出版商: AIP
数据来源: AIP
摘要:
We have studied the effect of oxygen on the diffusion of Ni into Pt in the Pt‐Ni‐Pt films. Below 400 °C, the diffusion rates of Ni into both Pt layers are greatly reduced by oxygen. Above 500 °C, however, Ni rapidly mixes with Pt layers, which leads to the formation of Ni oxide on the Pt surface in the presence of oxygen.
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