Micrometer size patterns of copper phthalocyanine derivatives were fabricated from 1,2,4,5‐tetracyanobenzene (TCNB) by a selective chemical vapor deposition method. Copper films were patterned on silicon wafers by photolithography and wet etching techniques, sealed in a glass tube with TCNB, and heated at different temperatures. Controlling the treatment temperature, selective chemical vapor deposition was achieved to produce copper phthalocyanine thin films on the copper patterns. After thermal annealing of the deposited film in vacuum, the films were converted to a polymer of the copper phthalocyanines.