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Critical currents and Josephson penetration depth in planar thin‐film high‐TcJosephson junctions

 

作者: Sergey K. Tolpygo,   Michael Gurvitch,  

 

期刊: Applied Physics Letters  (AIP Available online 1996)
卷期: Volume 69, issue 25  

页码: 3914-3916

 

ISSN:0003-6951

 

年代: 1996

 

DOI:10.1063/1.117568

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The temperature dependence of the critical current in planar high‐TcJosephson junctions fabricated in YBa2Cu3O7thin films by focused electron irradiation has been studied. It is shown that in the range of critical current densities spanning more than five orders of magnitude and temperature range 0.1≤T/Tc≤1, the critical current densityjcvaries as (1−T/Tc)2. TheTdependence of the critical current, however, is affected by the transition from the narrow junction to the wide junction limit asjcincreases. An expression for the Josephson penetration depth in thin‐film coplanar structures is derived, and magnetic field penetration depth in junction banks is extracted from theIc(T) dependences. ©1996 American Institute of Physics.

 

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