首页   按字顺浏览 期刊浏览 卷期浏览 Study of the Filamentary Growth of Silicon Crystals from the Vapor
Study of the Filamentary Growth of Silicon Crystals from the Vapor

 

作者: R. S. Wagner,   W. C. Ellis,   K. A. Jackson,   S. M. Arnold,  

 

期刊: Journal of Applied Physics  (AIP Available online 1964)
卷期: Volume 35, issue 10  

页码: 2993-3000

 

ISSN:0021-8979

 

年代: 1964

 

DOI:10.1063/1.1713143

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The preparation from vapor and the structure of filamentary crystals of silicon have been studied in detail. It was found by chemical etching, by examination for a twist associated with a screw dislocation, and by observations in the electron microscope, that both ribbons and needles of small dimensions are free of dislocations and imperfections. Certain impurities such as gold, nickel, or platinum, however, are essential for the growth of filamentary crystals.The growth of micron size and larger whisker crystals from the vapor takes place in two stages. The first is a rapid extension in length of a leader‐like crystal of small cross section; the second, a slow thickening of the leader through deposition on lateral faces. Initial growth is associated with impurities and does not require an axial screw dislocation. Subsequent growth may be explained by classical nucleation at a step and lateral translation of the step.

 

点击下载:  PDF (899KB)



返 回