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Thermal Expansion Measurements to 130°C by Laser Interferometry

 

作者: W. A. Plummer,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1972)
卷期: Volume 3, issue 1  

页码: 36-43

 

ISSN:0094-243X

 

年代: 1972

 

DOI:10.1063/1.2948571

 

出版商: AIP

 

数据来源: AIP

 

摘要:

To date, most applications of materials having very low thermal expansion have been near 20°C. In 1968 Plummer and Hagy reported measurements on some low‐expansion materials using Fizeau interferometry attaining high precision and accuracy. These measurements were limited to a maximum temperature of 80°C. In response to interest in expansion of these materials at somewhat higher temperatures, the apparatus has been modified to permit measurements to 130°C. Results of these measurements are reported.

 

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