Structural analysis and photoemissive response of the Ge/Cs/O (100) surface
作者:
Bernard Goldstein,
Ramon U. Martinelli,
期刊:
Journal of Applied Physics
(AIP Available online 1973)
卷期:
Volume 44,
issue 9
页码: 4244-4245
ISSN:0021-8979
年代: 1973
DOI:10.1063/1.1662936
出版商: AIP
数据来源: AIP
摘要:
The Ge (100) surface adsorbs Cs and O2in the same manner as does the Si (100) surface, but the resulting Ge/Cs/O surface does not exhibit negative electron affinity (NEA). Both Cs and O2are adsorbed in an ordered way—each adsorbate exhibiting the same 2 × 2 LEED pattern as the clean Ge substrate. Cs must be adsorbed before O2if the final Ge/Cs/O surface is to be ordered. The spectral photoemission data from the Ge/Cs (100) surface shows a threshold at 1.56 eV, while the threshold of the Ge/Cs/O surface is 1.12 eV, both of which are not band‐gap limited. From both the Ge/Cs and the Ge/Cs/O (100) surfaces, photoemission is characterized by hot electron emission over a positive energy barrier at the surface.
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