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InP/InGaAs photodetector based on a high electron mobility transistor layer structure: Its response at 1.3 &mgr;m wavelength

 

作者: M. Horstmann,   M. Marso,   A. Fox,   F. Ru¨ders,   M. Hollfelder,   H. Hardtdegen,   P. Kordos,   H. Lu¨th,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 67, issue 1  

页码: 106-108

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.115497

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We report on the investigation of the room‐temperature optoelectronic behavior of a metal–semiconductor–metal two‐dimensional electron gas photodiode based on the two‐dimensional electron gas of a high electron mobility transistor structure. The photodetector is fabricated in the InP/InGaAs material system, without use of Al‐containing layers. Optoelectronic measurements on a device with a finger spacing of 3 &mgr;m show a full width at half‐maximum (FWHM) of the pulse response of ≤60 ps, which is the resolution limit of our measurement equipment. Low‐temperature measurements at 40 K with electro‐optical sampling at a wavelength of 890 nm show a FWHM of 1 ps. ©1995 American Institute of Physics.

 

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