InP/InGaAs photodetector based on a high electron mobility transistor layer structure: Its response at 1.3 &mgr;m wavelength
作者:
M. Horstmann,
M. Marso,
A. Fox,
F. Ru¨ders,
M. Hollfelder,
H. Hardtdegen,
P. Kordos,
H. Lu¨th,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 1
页码: 106-108
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.115497
出版商: AIP
数据来源: AIP
摘要:
We report on the investigation of the room‐temperature optoelectronic behavior of a metal–semiconductor–metal two‐dimensional electron gas photodiode based on the two‐dimensional electron gas of a high electron mobility transistor structure. The photodetector is fabricated in the InP/InGaAs material system, without use of Al‐containing layers. Optoelectronic measurements on a device with a finger spacing of 3 &mgr;m show a full width at half‐maximum (FWHM) of the pulse response of ≤60 ps, which is the resolution limit of our measurement equipment. Low‐temperature measurements at 40 K with electro‐optical sampling at a wavelength of 890 nm show a FWHM of 1 ps. ©1995 American Institute of Physics.
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