Micromechanical structures can be made by selectively etching sacrificial layers from a multilayer sandwich of patterned thin films. This paper reviews this technology, termed surface micromachining, with an emphasis on polysilicon microstructures. Micromechanical characteristics of thin‐film microstructures critically depend on the average residual stress in the film, as well as on the stress variation in the direction of deposition. The stress in low‐pressure chemical vapor deposition polysilicon varies with deposition temperature, doping, and annealing cycles. Applications of surface micromachining to fabricate beams, plates, sealed cavities, and linear and rotary bearings are discussed.