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Charge state control of hydrogenation in silicon

 

作者: C. H. Seager,   R. A. Anderson,  

 

期刊: Journal of Applied Physics  (AIP Available online 1996)
卷期: Volume 80, issue 1  

页码: 151-155

 

ISSN:0021-8979

 

年代: 1996

 

DOI:10.1063/1.362825

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We demonstrate that periodic exposure to zero bias duringinsituhydrogenation of reverse‐biasedp‐type Schottky barrier structures has dramatic effects on H penetration. H influx can be slowed or even stopped by such protocols. By contrast, similar pulsing techniques produce almost no changes of penetration inn‐type barriers during hydrogenation; this latter observation is in sharp contrast to the expectations that charge conversion from H+to H−would reverse the drift of H species. We suggest that these effects are caused by the charge conversion of relatively immobile H‐related defects. In thep‐type barriers this results in a weakening or reversal of the near surface electric field, effectively stopping the drift of H+into the bulk. ©1996 American Institute of Physics.

 

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