Charge state control of hydrogenation in silicon
作者:
C. H. Seager,
R. A. Anderson,
期刊:
Journal of Applied Physics
(AIP Available online 1996)
卷期:
Volume 80,
issue 1
页码: 151-155
ISSN:0021-8979
年代: 1996
DOI:10.1063/1.362825
出版商: AIP
数据来源: AIP
摘要:
We demonstrate that periodic exposure to zero bias duringinsituhydrogenation of reverse‐biasedp‐type Schottky barrier structures has dramatic effects on H penetration. H influx can be slowed or even stopped by such protocols. By contrast, similar pulsing techniques produce almost no changes of penetration inn‐type barriers during hydrogenation; this latter observation is in sharp contrast to the expectations that charge conversion from H+to H−would reverse the drift of H species. We suggest that these effects are caused by the charge conversion of relatively immobile H‐related defects. In thep‐type barriers this results in a weakening or reversal of the near surface electric field, effectively stopping the drift of H+into the bulk. ©1996 American Institute of Physics.
点击下载:
PDF
(298KB)
返 回