CRYSTALLOGRAPHIC SYMMETRY OF SURFACE STATE DENSITY IN THERMALLY OXIDIZED SILICON
作者:
Emil Arnold,
Joshua Ladell,
Gerald Abowitz,
期刊:
Applied Physics Letters
(AIP Available online 1968)
卷期:
Volume 13,
issue 12
页码: 413-416
ISSN:0003-6951
年代: 1968
DOI:10.1063/1.1652496
出版商: AIP
数据来源: AIP
摘要:
The detailed dependence of surface state density on crystallographic orientation was determined by measuring the ac metal‐oxide‐semiconductor conductance on the surface of a thermally oxidized single‐crystal silicon hemisphere. It was found that the 〈111〉 poles are located at maxima, the 〈100〉 poles at minima, and the 〈110〉 poles at saddle points in the surface state density distribution. The symmetry of the surface state density distribution is generally similar to that of the ``fixed'' interface charge density, but differences are noted in the vicinity of the 〈100〉 directions.
点击下载:
PDF
(286KB)
返 回