Subsurface particle growth kinetics in physical vapor deposition
作者:
David Robertson,
Arnold L. Pundsack,
期刊:
Journal of Applied Physics
(AIP Available online 1981)
卷期:
Volume 52,
issue 1
页码: 455-462
ISSN:0021-8979
年代: 1981
DOI:10.1063/1.329807
出版商: AIP
数据来源: AIP
摘要:
In a well‐defined range of conditions, selenium vapor deposited onto a thermoplastic substrate forms a monolayer array of spherical particles located just beneath the surface. A model for the growth of these particles has been proposed. In it, the particles grow by two mechanisms: (i)capture of selenium molecules diffusing into the substrate, and (ii)coalescence with other particles when they grow into contact. Expressions for both rates are presented and analytical solutions for the time dependence of the numbers and sizes of the particles are devived for two limiting cases—complete condensation (in which all impinging materials become incorporated into the particles) and incomplete condensation (in which re‐evaporation of adsorbed species limits the kinetics). Experimental data confirm the model’s predictions.
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