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Voltage-controlled three terminal GaAs negative differential resistance device usingn+-i-p+-i-n+structure

 

作者: K.F.Yarn,   Y.H.Wang,   C.Y.Chang,   C.S.Chang,  

 

期刊: IEE Proceedings G (Circuits, Devices and Systems)  (IET Available online 1990)
卷期: Volume 137, issue 3  

页码: 219-224

 

年代: 1990

 

DOI:10.1049/ip-g-2.1990.0033

 

出版商: IEE

 

数据来源: IET

 

摘要:

A novel three terminal GaAsn+-i-p+-i-n+negative differential resistance device prepared by molecular beam epitaxy is demonstrated for the first time. The peak-to-valley current ratios can be modulated by the third external applied voltage which can be expressed asIp/Iv= 5.08 × 10−3exp [1.999VBE] at room temperature, whereVBEis in units of volts. It implies that large peak-to-valley current ratios (e.g.IP/Iv= 300 atVBE= 5.5 V) and large peak current densities can easily be obtained just by increasing theVBEbias. A phenomenological bipolar-unipolar transition model is proposed to interpret the observed behavior and confirmed by experiments.

 

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