Voltage-controlled three terminal GaAs negative differential resistance device usingn+-i-p+-i-n+structure
作者:
K.F.Yarn,
Y.H.Wang,
C.Y.Chang,
C.S.Chang,
期刊:
IEE Proceedings G (Circuits, Devices and Systems)
(IET Available online 1990)
卷期:
Volume 137,
issue 3
页码: 219-224
年代: 1990
DOI:10.1049/ip-g-2.1990.0033
出版商: IEE
数据来源: IET
摘要:
A novel three terminal GaAsn+-i-p+-i-n+negative differential resistance device prepared by molecular beam epitaxy is demonstrated for the first time. The peak-to-valley current ratios can be modulated by the third external applied voltage which can be expressed asIp/Iv= 5.08 × 10−3exp [1.999VBE] at room temperature, whereVBEis in units of volts. It implies that large peak-to-valley current ratios (e.g.IP/Iv= 300 atVBE= 5.5 V) and large peak current densities can easily be obtained just by increasing theVBEbias. A phenomenological bipolar-unipolar transition model is proposed to interpret the observed behavior and confirmed by experiments.
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