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New directions in amorphous and thin film silicon materials and devices

 

作者: Vikram L. Dalal,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1999)
卷期: Volume 462, issue 1  

页码: 82-87

 

ISSN:0094-243X

 

年代: 1999

 

DOI:10.1063/1.57947

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We review the continuing improvements in amorphous, microcrystalline and thin film crystalline Si materials and devices over the past few years. Many of these improvements have resulted from asking fundamental questions regarding how the material is grown, what its structure is, and how to make it better. For amorphous materials, significant changes in growth chemistry have resulted in reductions in H content in some cases, changes in localized H bonding, changes in microstructure, and in reductions in microstructural voids in the material, thereby leading to improved stability and performance. By achieving a transition from amorphous to microcrystalline phase, it has been possible to make high quality, small grained crystalline Si films with naturally passivated grain boundaries. The high quality of microcrystalline films have allowed one to make high performance solar cells in these materials. Finally, the achievement of super-back reflectors and growth of high quality thin film crystalline Si films on these back reflectors have resulted in the achievement of thin film Si solar cells exceeding 10&percent; conversion efficiency. ©1999 American Institute of Physics.

 

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