Activation studies of low-dose Si implants in gallium nitride
作者:
C. J. Eiting,
P. A. Grudowski,
R. D. Dupuis,
H. Hsia,
Z. Tang,
D. Becher,
H. Kuo,
G. E. Stillman,
M. Feng,
期刊:
Applied Physics Letters
(AIP Available online 1998)
卷期:
Volume 73,
issue 26
页码: 3875-3877
ISSN:0003-6951
年代: 1998
DOI:10.1063/1.122922
出版商: AIP
数据来源: AIP
摘要:
The implantation of Si ions into undoped high-resistivity GaN films is of interest for the realization of high-performance digital and monolithic microwave integrated circuits. We report the effect of postimplant annealing conditions on the electrical, optical, and surface morphology of Si ion-implanted GaN films. We demonstrate high activation efficiencies for low-dose Si implants into unintentionally doped GaN/sapphire heteroepitaxial films. The Si ions were implanted through an epitaxial AlN cap layer at 100 keV and a dose∼5×1014 cm−2.Samples were subsequently annealed in an open-tube furnace for various times and temperatures. The postanneal electrical activation is correlated with the surface morphology of the film after annealing. The samples annealed at1150 °CinN2for 5 min. exhibited a smooth surface morphology and a sheet electron concentrationns∼6.8×1013 cm−2.©1998 American Institute of Physics.
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