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Location of Si-interstitials in radiation damaged Si-crystals with double alignment channeling technique

 

作者: K. Morita,   H.D. Carstanjen,  

 

期刊: Radiation Effects  (Taylor Available online 1976)
卷期: Volume 28, issue 1-2  

页码: 97-101

 

ISSN:0033-7579

 

年代: 1976

 

DOI:10.1080/00337577608233033

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

In a double alignment backscattering channeling experiment the angular dependence (for detector rotation) of helium ions-backscattered from a radiation damaged silicon crystal at room temperature-has been studied. The 1.5 MeV He+-beam was incident on the specimen parallel to <110>, the backscattered ions were registered on plastic films in the blocking directions [110], [010] and [111] and in small angular ranges around these blocking directions. The position of silicon interstitials is discussed by comparing the backscattering yield profiles-obtained as a function of emission angle from the spatial distribution of ion tracks on the plastic films-with calculated yield profiles on the computer simulations.

 

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