The properties of Cr–Si–O thin film resistors by dc conventional sputtering

 

作者: K. Furuta,   S. Miyagawa,   T. Kamei,   H. Ando,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  （AIP Available online 1983）
卷期: Volume 1, issue 3  

页码: 1565-1566

 

ISSN:0734-2101

 

年代: 1983

 

DOI:10.1116/1.572264

 

出版商: American Vacuum Society

 

关键词: thin films;oxidation;stability;sputtering;resistors;microstructure;electrical properties;electric conductivity;chromium;silicon;oxygen;heat treatments;stabilization;fabrication;electron microscopy;crystallization

 

数据来源: AIP

 

 

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