The key elements of a scanning near field microscope (SNOM) are high throughput and good spatial resolution. While both are desirable they are difficult to combine in a probe that is reproducible and durable. A batch‐fabrication method is being developed for AFM based SNOM with lithographically defined structured apertures. Due to the lithographic control of aperture size and shape the probes can be optimised for the imaging of sub‐wavelength structures, for spectroscopic analysis, fluorescence or polarisation measurements. © 2003 American Institute of Physics