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Elastic and anelastic properties of chemical vapor deposited epitaxial 3C‐SiC

 

作者: C. M. Su,   Manfred Wuttig,   A. Fekade,   M. Spencer,  

 

期刊: Journal of Applied Physics  (AIP Available online 1995)
卷期: Volume 77, issue 11  

页码: 5611-5615

 

ISSN:0021-8979

 

年代: 1995

 

DOI:10.1063/1.359551

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Chemical vapor deposited 3C‐SiC films were micromachined into free standing cantilevers and their anelastic and elastic properties were determined by a vibrating reed technique. Despite a high density of defects, epitaxial 3C‐SiC exhibits extremely high mechanicalQwhich is essential for resonator sensors and actuators. An anelastic relaxation peak was found with an associated activation energy of 0.94 eV. Doping caused splitting of this peak. The mechanism of the mechanical relaxation peak is discussed in relation to defect movement under stress. Young’s modulus of epitaxial undoped 3C‐SiC was found to be 694 GPa,p‐doping reduced it to 474 Gpa. ©1995 American Institute of Physics.

 

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