首页   按字顺浏览 期刊浏览 卷期浏览 Analysis of temperature dependence of Hall mobility of nondoped and nitrogen‐dop...
Analysis of temperature dependence of Hall mobility of nondoped and nitrogen‐doped &bgr;‐SiC single crystals grown by chemical vapor deposition

 

作者: Akira Suzuki,   Atsuko Ogura,   Katsuki Furukawa,   Yoshihisa Fujii,   Mitsuhiro Shigeta,   Shigeo Nakajima,  

 

期刊: Journal of Applied Physics  (AIP Available online 1988)
卷期: Volume 64, issue 5  

页码: 2818-2821

 

ISSN:0021-8979

 

年代: 1988

 

DOI:10.1063/1.341591

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Temperature dependencies of Hall mobility of nondoped and nitrogen‐dopedn‐type &bgr;‐SiC films have been analyzed using a conventional theoretical model. Considering acoustic, polar optical, and piezoelectric lattice scatterings, as well as ionized and neutral impurity scatterings, theoretical calculations well fitted to the experimental results are obtained at 70–1000 K. Contributions of acoustic, polar optical, and piezoelectric scatterings to the whole lattice scattering are 84%, 14%, and 2% at 300 K, respectively. Impurity compensation ratioNA/NDof nondoped films increases from 0.45 to 0.96 with increasing Si/C ratio in the source gases. Nitrogen‐doped films show constant compensation ratios of 0.25–0.30 with various doping amounts. These values are different from the previous results obtained by the analysis of temperature dependencies of carrier concentration.

 

点击下载:  PDF (480KB)



返 回