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Interfacial structure of nanocrystalline Fe73.5Cu1Nb3Si13.5B9studied by positron annihilation

 

作者: T. Liu,   Z. T. Zhao,   Z. X. Xu,   R. Z. Ma,   Y. H. Guo,   H. M. Cao,   Y. Y. Wang,  

 

期刊: Journal of Applied Physics  (AIP Available online 1995)
卷期: Volume 77, issue 12  

页码: 6214-6216

 

ISSN:0021-8979

 

年代: 1995

 

DOI:10.1063/1.359150

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Nanocrystalline Fe73.5Cu1Nb3Si13.5B9alloy prepared by the crystallization of amorphous alloy has been studied by using the positron annihilation technique. Positron parameters, i.e., lifetime &tgr;1, &tgr;2, and line shape parameterSare obtained as a function of the annealing temperature. The results show that there exist two types of defects at the interfaces of nanocrystalline Fe73.5Cu1Nb3Si13.5B9alloy: vacancy‐like and vacancy‐like group microvoids characterized by the lifetime &tgr;1and &tgr;2. The former is in overwhelming majority. The changes of the structural defects corresponding to different stages, structural relaxation, and crystallization are discussed. ©1995 American Institute of Physics.

 

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