Interfacial structure of nanocrystalline Fe73.5Cu1Nb3Si13.5B9studied by positron annihilation
作者:
T. Liu,
Z. T. Zhao,
Z. X. Xu,
R. Z. Ma,
Y. H. Guo,
H. M. Cao,
Y. Y. Wang,
期刊:
Journal of Applied Physics
(AIP Available online 1995)
卷期:
Volume 77,
issue 12
页码: 6214-6216
ISSN:0021-8979
年代: 1995
DOI:10.1063/1.359150
出版商: AIP
数据来源: AIP
摘要:
Nanocrystalline Fe73.5Cu1Nb3Si13.5B9alloy prepared by the crystallization of amorphous alloy has been studied by using the positron annihilation technique. Positron parameters, i.e., lifetime &tgr;1, &tgr;2, and line shape parameterSare obtained as a function of the annealing temperature. The results show that there exist two types of defects at the interfaces of nanocrystalline Fe73.5Cu1Nb3Si13.5B9alloy: vacancy‐like and vacancy‐like group microvoids characterized by the lifetime &tgr;1and &tgr;2. The former is in overwhelming majority. The changes of the structural defects corresponding to different stages, structural relaxation, and crystallization are discussed. ©1995 American Institute of Physics.
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