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Disappearance of impurity levels in silicon and germanium due to screening

 

作者: J. R. Lowney,   A. H. Kahn,   J. L. Blue,   C. L. Wilson,  

 

期刊: Journal of Applied Physics  (AIP Available online 1981)
卷期: Volume 52, issue 6  

页码: 4075-4080

 

ISSN:0021-8979

 

年代: 1981

 

DOI:10.1063/1.329256

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have studied the disappearance of impurity levels in silicon and germanium due to free‐carrier screening of the Coulomb field of the impurity ions. The ground‐state eigenfunctions and eigenvalues have been calculated for electrons described by an ellipsoidal effective‐mass Hamiltonian. A two‐dimensional finite‐element analysis was used to obtain the solutions. Only moderate carrier densities (1019cm−3for silicon and 1018cm−3for germanium) are needed to cause the impurity levels to disappear into the conduction band, the result at high doping densities being simply a degenerate semiconductor.

 

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