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Insitux‐ray topographic observation of dislocation behavior in In‐doped GaAs crystals

 

作者: S. Tohno,   S. Shinoyama,   A. Katsui,   H. Takaoka,  

 

期刊: Applied Physics Letters  (AIP Available online 1986)
卷期: Volume 49, issue 18  

页码: 1204-1206

 

ISSN:0003-6951

 

年代: 1986

 

DOI:10.1063/1.97415

 

出版商: AIP

 

数据来源: AIP

 

摘要:

This letter describes the results ofinsituobservations of dislocation behavior in In‐doped GaAs crystals at high temperatures using synchrotron radiation topography and high‐temperature stressing apparatus. The generation and propagation processes of dislocations in a preyield stage have been investigated by making a comparison with undoped crystals. We find that there is a one‐directional predominance in the generation and propagation of dislocations in In‐doped crystals.

 

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