Insitux‐ray topographic observation of dislocation behavior in In‐doped GaAs crystals
作者:
S. Tohno,
S. Shinoyama,
A. Katsui,
H. Takaoka,
期刊:
Applied Physics Letters
(AIP Available online 1986)
卷期:
Volume 49,
issue 18
页码: 1204-1206
ISSN:0003-6951
年代: 1986
DOI:10.1063/1.97415
出版商: AIP
数据来源: AIP
摘要:
This letter describes the results ofinsituobservations of dislocation behavior in In‐doped GaAs crystals at high temperatures using synchrotron radiation topography and high‐temperature stressing apparatus. The generation and propagation processes of dislocations in a preyield stage have been investigated by making a comparison with undoped crystals. We find that there is a one‐directional predominance in the generation and propagation of dislocations in In‐doped crystals.
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