Deposition of high-quality NiMnSb magnetic thin films at moderate temperatures
作者:
J. A. Caballero,
Y. D. Park,
A. Cabbibo,
J. R. Childress,
F. Petroff,
R. Morel,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 81,
issue 6
页码: 2740-2744
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.363977
出版商: AIP
数据来源: AIP
摘要:
Thin films of the ferromagnetic Heusler alloy NiMnSb, of interest for magnetic multilayer devices because of their predicted half-metallic (i.e., 100&percent; spin-polarized) transport properties, have been successfully deposited by rf magnetron sputtering from a single composite target. A novel combination of low argon gas pressure, low deposition rates, and moderate substrate temperatures (250–350 °C) are shown to result in high-quality, low-roughness polycrystalline films of theC1b-type crystal structure, with thicknesses as low as 100 Å, without the need for any post-deposition annealing. The structural properties of these films, determined by x-ray diffraction and atomic force microscopy are presented as a function of deposition conditions. The magnetic properties and resistivity are consistent with bulk MiMnSb, which suggests that they will be effective as spin-polarized conducting layers in multilayer thin-film structures. ©1997 American Institute of Physics.
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