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A dislocation model relating apparent charge density to lattice mismatch in epitaxial InGaAs/InP

 

作者: A. R. Hutson,  

 

期刊: Journal of Applied Physics  (AIP Available online 1986)
卷期: Volume 60, issue 3  

页码: 1038-1041

 

ISSN:0021-8979

 

年代: 1986

 

DOI:10.1063/1.337394

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Using a new model relating dislocation charge to Fermi level, we have simulated the differential capacitance resulting from the inclined dislocations accompanying the misfit dislocations in epitaxial InGaAs/InP samples. The result is a quadratic dependence of charge upon mismatch which is in quantitative agreement with experiments of Macranderetal. for a misfit dislocation segment length equal to about nine times the dislocation spacing.

 

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