Vacuum arc ion sources

 

作者: Ian G. Brown,  

 

期刊: Review of Scientific Instruments  (AIP Available online 1994)
卷期: Volume 65, issue 10  

页码: 3061-3081

 

ISSN:0034-6748

 

年代: 1994

 

DOI:10.1063/1.1144756

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The vacuum arc is a rich source of highly ionized metal plasma that can be used to make a high current metal ion source. Vacuum arc ion sources have been developed for a range of applications including ion implantation for materials surface modification, particle accelerator injection for fundamental nuclear physics research, and other fundamental and applied purposes. The beam parameters can be attractive, and the source has provided a valuable addition to the spectrum of ion sources available to the experimenter. Beams have been produced from over 50 of the solid metals of the periodic table, with mean ion energy up to several hundred keV and with beam current up to several amperes. Typically the source is repetitively pulsed with pulse length of order a millisecond and duty cycle of order 1%, and operation of a dc embodiment has been demonstrated. Here the source fundamentals and operation are reviewed, the source and beam characteristics summarized, and some applications examined.

 

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