Extreme ultraviolet emission from gas puff plasmas
作者:
R. D. Bleach,
P. G. Burkhalter,
D. J. Nagel,
R. L. Schneider,
期刊:
Journal of Applied Physics
(AIP Available online 1983)
卷期:
Volume 54,
issue 3
页码: 1273-1277
ISSN:0021-8979
年代: 1983
DOI:10.1063/1.332191
出版商: AIP
数据来源: AIP
摘要:
Intense extreme ultraviolet (XUV) radiation has a variety of research and production applications. Emission in the 30–300 A˚ range has been measured from noble gas plasmas created by puffing gas into the Pithon electron beam generator at Physics International Co. Spectral, spatial, and temporal measurements from neon, argon, krypton, and xenon plasmas show that sufficient radiation is produced for several applications.
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