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Extreme ultraviolet emission from gas puff plasmas

 

作者: R. D. Bleach,   P. G. Burkhalter,   D. J. Nagel,   R. L. Schneider,  

 

期刊: Journal of Applied Physics  (AIP Available online 1983)
卷期: Volume 54, issue 3  

页码: 1273-1277

 

ISSN:0021-8979

 

年代: 1983

 

DOI:10.1063/1.332191

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Intense extreme ultraviolet (XUV) radiation has a variety of research and production applications. Emission in the 30–300 A˚ range has been measured from noble gas plasmas created by puffing gas into the Pithon electron beam generator at Physics International Co. Spectral, spatial, and temporal measurements from neon, argon, krypton, and xenon plasmas show that sufficient radiation is produced for several applications.

 

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