Sputtering of Dielectrics by High‐Frequency Fields
作者:
G. S. Anderson,
Wm. N. Mayer,
G. K. Wehner,
期刊:
Journal of Applied Physics
(AIP Available online 1962)
卷期:
Volume 33,
issue 10
页码: 2991-2992
ISSN:0021-8979
年代: 1962
DOI:10.1063/1.1728549
出版商: AIP
数据来源: AIP
摘要:
A novel method for sputtering insulators in the plasma of a low‐pressure discharge is described. The method utilizes rf fields whereby the positive charge accumulation at the target surface, resulting from positive ion bombardment, is periodically neutralized during each cycle. The method has many useful applications for cleaning, etching, and sputtering of insulators, as well as for removing deposits from observation windows.
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