Electron cyclotron resonance plasma oxidation studies of InP
作者:
Y. Z. Hu,
J. Joseph,
E. A. Irene,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1994)
卷期:
Volume 12,
issue 2
页码: 540-546
ISSN:1071-1023
年代: 1994
DOI:10.1116/1.587035
出版商: American Vacuum Society
关键词: INDIUM PHOSPHIDES;OXIDATION;PLASMA;ECR HEATING;ELLIPSOMETRY;PHOTOELECTRON SPECTROSCOPY;ETCHING;GROWTH RATE;InP
数据来源: AIP
摘要:
Electron cyclotron resonance plasma oxidation of InP was studied using both spectroscopic and single wavelength ellipsometry employed during the oxidation process. A two layer oxide was observed with the outer layer being In rich and the inner layer P rich as confirmed from x‐ray photoelectron spectroscopy and etch rate studies. Optical models and oxidation kinetics are analyzed. From positive substrate bias effects on oxidation rates, negative ion oxidant species were identified as dominant and oxide etching was observed at negative bias. Plasma oxidation, like thermal oxidation, yielded excess P near the semiconductor surface which would degrade electronic properties.
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